The last few years have been marked by an increasing number of articles written by eminent
market researchers concerned with the future of our industry. Their concerns are based …

A global or zero-dimensional model for C 4 F 8 plasmas is formulated by coupling gas
phase and wall surface reaction kinetics. A set of surface reactions implements experimental …

Gas phase and reactor wall-surface kinetics are coupled in a global model for SF 6 plasmas.
A complete set of gas phase and surface reactions is formulated. The rate coefficients of the …

The effect of scale, processing conditions, interfacial tension and viscosity of the dispersed
phase on power draw and drop size distributions in three in-line Silverson rotor–stator mixers …

The preparation of dilute aqueous silicone oil emulsions has been investigated with particular
attention to the effect of oil viscosity (0.49-350 mPa s), impeller selection (equal diameter …

Understanding the consequences of local surface charging on the evolving etching profile is
a critical challenge in high density plasma etching. Deflection of the positively charged ions …

With ever increasing demands on device patterning to achieve smaller critical dimensions,
the need for precise, controllable atomic layer etching (ALE) is steadily increasing. In this work…

This paper reports on large area, metal-free deposition of nanocrystalline graphene (NCG)
directly onto wet thermally oxidized 150 mm silicon substrates using parallel-plate plasma-…

The goal of high-throughput screening is to enable screening of compound libraries in an
automated manner to identify quality starting points for optimization. This often involves …

Promising electronic and optoelectronic properties of two-dimensional (2D) materials have
spurred research into large area fabrication through vapour deposition and etching. However…